
This report contains the following detailed information:
- Selected teardown photographs, package photographs, package X-rays, die markings, and die photographs
- Scanning electron microscopy (SEM) cross-sectional micrographs of the general structure of the die, including dielectric materials, metals, major features, and transistors
- Transmission electron microscopy (TEM) cross-sectional micrographs of the general structure of the die, including dielectric materials, metals, major features, and transistors
- Scanning capacitance microscopy (SCM) and scanning microwave impedance microscopy (sMIM) images of the dopant structures
- Spreading resistance profiling (SRP) was performed in three areas of the die to provide quantitative measures of the substrate doping
- Measurements of vertical and horizontal dimensions of major microstructural features
- Plan-view optical micrograph of the die delayered to metal 3, polysilicon and diffusion
- Identification of major functional blocks on a diffusion die photograph
- Table of functional block sizes and percentage die utilization